SHIRAI Hiroshi | Toshiba Ceramics Co., Ltd., Research and Development Center
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概要
Toshiba Ceramics Co., Ltd., Research and Development Center | 論文
- Determination of Thickness of Thin Thermal Oxide Layers on Czochralski-Grown Silicon Wafers from their Longitudinal Optical Vibrational Mode
- Dependence of Time Dependent Dielectric Breakdown Characteristics on Mechanism for Silicon Epitaxial Growth on Misoriented Czochralski Silicon Crystal
- Automatic tap control system for 132kV phase shifting transformer (保護リレーシステム研究会 電力系統の保護・監視制御・計測解析技術)
- Determination of Interstitial Oxygen Concentration in Oxygen-Precipitated Silicon Wafers by Low-Temperature High-Resolution Infrared Spectroscopy