KAWAI Yasuaki | VLSI Research and Development Center, Oki Electric Industry Co., Ltd.
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概要
VLSI Research and Development Center, Oki Electric Industry Co., Ltd. | 論文
- Mechanical Effects of Hafnium and Boron Addition to Aluminum Alloy Films for Submicrometer LSI Interconnects
- New Characterization of TiSi_2 Local Wiring Technology and Its Impact on Low Power/High Speed Quarter Micron CMOS
- Effects of Insulator Surface Roughness on Al-Alloy Film Crystallographic Orientation in Al-Alloy/Ti/Insulator Structure
- Influence of Interface Structure between Overlayered Titanium Nitride Film and Aluminum on Multilayered Interconnects
- Interfacial Reactions in Al-Alloy/Ti/Silicon-Dioxide-Based Substrate Structures for Multilayered Interconnects