Natsuaki Nobuyoshi | Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185

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Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185 | 論文

• A Rigorous Solution of Two-Dimensional Diffraction Based on the Huygens-Fresnel Principle
• Improvement of SiO2/Si Interface Properties Utilising Fluorine Ion Implantation and Drive-in Diffusion
• Characterization of Si Layers Deposited on (100) Si Substrates by Plasma CVD and Its Application to Si HBTs
• Fabrication of an Axisymmetric Wolter Type I Mirror with a Gold Deposited Reflecting Surface
• Vibrational and Rotational Energy Distributions in a Hot Cl2 Molecular Beam

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