Kobayashi Satoshi | R&D Center, HOYA Corporation, 3-3-1 Musashino, Akishima, Tokyo 196-8510, Japan
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- R&D Center, HOYA Corporation, 3-3-1 Musashino, Akishima, Tokyo 196-8510, Japanの論文著者
R&D Center, HOYA Corporation, 3-3-1 Musashino, Akishima, Tokyo 196-8510, Japan | 論文
- Direct Evaluation of Surface Roughness of Substrate and Interfacial Roughness in Molybdenum/Silicon Multilayers Using Extreme Ultraviolet Reflectometer
- Transparent Conductive Cu-doped ZnSe Film Deposited at Room Temperature Using Compound Sources Followed by Laser Annealing
- Quantum Dot Activated All-inorganic Electroluminescent Device Fabricated Using Solution-Synthesized CdSe/ZnS Nanocrystals
- Cleaning Characteristics of Contaminated Imaging Optics Using 172 nm Radiation