Niioka Hirohiko | Institute for NanoScience Design, Osaka University, Toyonaka, Osaka 560-8531, Japan
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- Institute for NanoScience Design, Osaka University, Toyonaka, Osaka 560-8531, Japanの論文著者
Institute for NanoScience Design, Osaka University, Toyonaka, Osaka 560-8531, Japan | 論文
- Improvement in the Property of Field Effect Transistor Having the HfO2/Ge Structure Fabricated by Photoassisted Metal Organic Chemical Vapor Deposition with Fluorine Treatment
- Preparation of BiFe0.9Co0.1O3 Films by Pulsed Laser Deposition under Magnetic Field
- Preparation of BiFeO3 Thin Films on SrRuO3/SrTiO3(001) Substrate by Dual Ion Beam Sputtering
- Ferroelectric and Piezoelectric Properties of Polycrystalline BiFeO3 Thin Films Prepared by Pulsed Laser Deposition under Magnetic Field
- Fabrication of a Flexible Array for Tactile Sensors with Microcantilevers and the Measurement of the Distribution of Normal and Shear Forces