Hirayama Taku | Tokyo Ohka Kogyo Co., Ltd., Samukawa, Kanagawa 253-0114, Japan
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Tokyo Ohka Kogyo Co., Ltd., Samukawa, Kanagawa 253-0114, Japan | 論文
- Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in Extreme Ultraviolet Lithography
- Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in Extreme Ultraviolet Lithography
- 6,13-Bis(triisopropylsilylethynyl) Pentacene Organic Field-Effect Transistors Utilizing Poly(p-silsesquioxane) Insulating Layers with Various Ratios of Phenol Groups