YANG Y. | National Nano Device Laboratory
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概要
National Nano Device Laboratory | 論文
- Combined Negative Bias Temperature Instability and Hot Carrier Stress Effects in Low Temperature Poly-Si Thin Film Transistors
- Plasma Treatment and Dry Etch Characteristics of Organic Low-k Dielectrics
- Effects of Helicon-Wave-Plasma Etching on the Charging Damage of Aluminum Interconnects
- Combination of Chemical Mechanical Polishing and Ultrahigh Vacuum Chemical Vapor Deposition Techniques to Fabricate Polycrystalline Thin Film Transistors
- Characterization of Hydrogen-Treated Pentacene Organic Thin Film Transistors