Kitamura Masaru | Corporate Manufacturing Engineering Center, Toshiba Corporation
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概要
Corporate Manufacturing Engineering Center, Toshiba Corporation | 論文
- Tight-Binding Quantum Chemical Calculations of Electronic Structures of Indium Tin Oxide
- Tight-Binding Quantum Chemical Calculations of Electronic Structures of Indium Tin Oxide
- A Highly Selective Photoresist Ashing Process for Silicon Nitride Films by Addition of Trifluoromethane : Semiconductors
- Photoresist Ashing Process Using Carbon Tetrafluoride Gas Plasma with Ammonia Gas Addition
- Dry Etching Characteristics of Si-based Materials Using CF_4/O_2 Atmospheric-Pressure Glow Discharge Plasma