Kawashima Yoshihito | Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

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概要

• 同名の論文著者
• Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japanの論文著者

関連著者

• Kijima Takeshi

  Research And Development For Future Electron Devices

• KAWASHIMA Yoshihito

  Tokyo Institute of Technology

• Ishiwara Hiroshi

  Tokyo Inst. Of Technol. Yokohama Jpn

• Ishiwara Hiroshi

  Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

• Kawashima Yoshihito

  Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

著作論文

• Ferroelectric Characteristics Control of (Bi,La)4Ti3O12 and SrBi2Ta2O9 Films by Addition of Silicates and Germanates

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