OSHIDA Makiko | NEC Corporation, Device Platforms Research Laboratories
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概要
NEC Corporation, Device Platforms Research Laboratories | 論文
- Improvement of Thermal Stability of MRAM Device with SiN Protective Film Deposited by HDP CVD
- Improvement of Thermal Stability of Magnetoresistive Random Access Memory Device with SiN Protective Film Deposited by High-Density Plasma Chemical Vapor Deposition
- Control of Multiple Magnetic Domain Walls by Current in a Co/Ni Nano-Wire
- 1.2nm HfSiON/SiON stacked gate insulators for 65nm-node MISFETs
- Suppression of Charges in Al_2O_3 Gate Dielectric and Improvement of MOSFET Performance by Plasma Nitridation(High-κ Gate Dielectrics)