Gangil Sandip | Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan

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概要

• Gangil Sandipの詳細を見る
• 同名の論文著者
• Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japanの論文著者

関連著者

• NAKAMURA Atsushi

  Research Institute for Information Science and Education, Hiroshima University

• Gangil Sandip

  Graduate School Of Electronic Science And Techonology Shizuoka University

• Gangil Sandip

  Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan

• 中村 純

  広島大学情報メディア教育研究センター

• 中村 純

  広大情報メディア

• Aoki Toru

  Research Institute Of Electronics Shizuoka University・graduate School Of Electronic Science And Tech

• Aoki Toru

  Research Institute Of Electronics Shizuoka University

• TEMMYO Jiro

  Photonic Devices Laboratory, Research Institute of Electronics, Shizuoka University

• Nakamura A

  Department Of Applied Physics Fukuoka University

• Nakamura Atsushi

  Photonic Devices Laboratory Research Institute Of Electronics Shizuoka University

• Gangil Sandip

  Graduate School of Electronic Science and Techonology, Shizuoka University

• Temmyo Jiro

  Research Institute of Electronics, Shizuoka University・Graduate School of Electronic Science and Tec

• TEMMYO Jiro

  Graduate School of Electronic Science and Technology, Shizuoka University

• Temmyo Jiro

  Photonic Devices Laboratory Research Institute Of Electronics Shizuoka University

• Shimomura Masaru

  Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan

• Temmyo Jiro

  Reseach Institute of Electronics, Shizuoka University, Hamamatsu 432-8011 Japan

• Aoki Toru

  Reseach Institute of Electronics, Shizuoka University, Hamamatsu 432-8011 Japan

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著作論文

• Doping and characterization for ZnO:N films grown by radical induced remote plasma metaloganic chemical vapor deposition
• Nonpolar $(11\bar{2}0)$ p-Type Nitrogen-Doped ZnO by Remote-Plasma-Enhanced Metalorganic Chemical Vapor Deposition

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