Abe Toshimi | Tohoku Institute of Technology, Sendai 982-8577, Japan

スポンサーリンク

概要

• 同名の論文著者
• Tohoku Institute of Technology, Sendai 982-8577, Japanの論文著者

関連著者

• Endoh Tetsuo

  Center For Interdisciplinary Research Tohoku University

• Suemitsu Maki

  Research Institute Of Electrical Communication Tohoku University

• Narita Yuzuru

  Yamagata University

• Abe Toshimi

  Tohoku Institute Of Technology

• Yasui Kanji

  Nagaoka Univ. Technol. Nagaoka‐shi Jpn

• Itoh Takashi

  Center For Information And Sciences Nippon Medical School

• Kinoshita Takeshi

  Graduate School Of Science And Engineering Yamaguchi University

• Enta Yoshiharu

  Graduate School Of Science And Technology Hirosaki University

• Nakazawa Hideki

  Graduate School of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan

• Kaimori Yuhta

  Graduate School of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan

• Asai Yuhki

  Graduate School of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan

• Mashita Masao

  Graduate School of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan

• Itoh Takashi

  Center of Interdisciplinary Research, Tohoku University, Sendai 980-8578, Japan

• Narita Yuzuru

  Yamagata University, Yonezawa, Yamagata 992-8510, Japan

• Yasui Kanji

  Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan

• Abe Toshimi

  Tohoku Institute of Technology, Sendai 982-8577, Japan

• Suemitsu Maki

  Research Institute of Electrical Communication (RIEC), Tohoku University, Sendai 980-8577, Japan

• Kinoshita Takeshi

  Graduate School of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan

もっと見る 閉じる

著作論文

• Effects of Silicon Source Gas and Substrate Bias on the Film Properties of Si-Incorporated Diamond-Like Carbon by Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition

スポンサーリンク