KEMBO Yukio | Production Engineering Research Laboratory, Hitachi, Ltd.,
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概要
Production Engineering Research Laboratory, Hitachi, Ltd., | 論文
- Influence of Deposition Conditions on Properties of a-SiGe:H Prepared by Microwave-Excited Plasma CVD : Condensed Matter
- Microwave-Excited Plasma CVD of a-Si:H Films Utilizing a Hydrogen Plasma Stream or by Direct Excitation of Silane
- Chemical Vapor Deposition of a-SiGe:H Films Utilizing a Microwave-Excited Plasma
- Fine Particle Inspection Down to 38 nm on Bare Wafer with Micro Roughness by Side-Scattering Light Detection
- Dependence of Lattice Constant Deviation and Refractive Index on Proton Concentration in Proton-Exchanged Optical Waveguides on a Single Crystal of LiNbO_3