Inoue Toshihisa | Department of Electoronics, Kyushu University
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概要
Department of Electoronics, Kyushu University | 論文
- Highly Stable a-Si:H Films Deposited by Using Multi-Hollow Plasma Chemical Vapor Deposition
- Metal-Insulator Transition in the Bi_2Sr_2Ca_Y_xCu_2O_ System
- Characterization of a Non-Superconducting Cuprate, Bi_2Sr_2YCu_2O_ : Electrical Properties of Condensed Matter
- Influence of Gas Flow Conditions on Cluster Size Distribution in the Gas Evaporation Method
- Cluster-Suppressed Plasma Chemical Vapor Deposition Method for High Quality Hydrogenated Amorphous Silicon Films