Hata Masahiko | Sumitomo Chemical Co., Ltd., Tsukuba, Ibaraki 300-3294, Japan

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概要

• Hata Masahikoの詳細を見る
• 同名の論文著者
• Sumitomo Chemical Co., Ltd., Tsukuba, Ibaraki 300-3294, Japanの論文著者

関連著者

• Yamada Hisashi

  Sumitomo Chemical

• TAKENAKA Mitsuru

  The University of Tokyo

• TAKAGI Shinichi

  The University of Tokyo

• Hata Masahiko

  Sumitomo Chemical

• Ohtake Akihiro

  National Institute For Materials Science

• Yasuda Tetsuji

  National Institute Of Advanced Industrial Science And Technology

• Miyata Noriyuki

  National Institute Of Advanced Industrial Science And Technology

• Urabe Yuji

  National Institute Of Advanced Industrial Science And Technology

• MAEDA Tatsuro

  National Institute of Advanced Industrial Science and Technology

• Yamada Hisashi

  Sumitomo Chemical Co., Ltd., Tsukuba, Ibaraki 300-3294, Japan

• Maeda Tatsuro

  National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8562, Japan

• Hoshii Takuya

  The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan

• Jevasuwan Wipakorn

  National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8562, Japan

• Lee Sunghoon

  The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan

• Hata Masahiko

  Sumitomo Chemical Co., Ltd., Tsukuba, Ibaraki 300-3294, Japan

• Takagi Shinichi

  The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan

• Yasuda Tetsuji

  National Institute for Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8562, Japan

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著作論文

• Controlling Anion Composition at Metal--Insulator--Semiconductor Interfaces on III--V Channels by Plasma Processing

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