OHYU Kiyonori | Central Research Laboratory, Hitachi Ltd.
スポンサーリンク
概要
関連著者
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Itoga Toshihiko
Central Research Laboratories Hitachi Ltd.
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OHYU Kiyonori
Central Research Laboratory, Hitachi Ltd.
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Natsuaki Nobuyoshi
Central Laboratory Hitachi Ltd.
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Natsuaki Nobuyoshi
Device Development Center Hitachi Lid.
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Itoga Toshihiko
Central Research Laboratory, Hitachi Ltd.
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NATSUAKI Nobuyoshi
Device Development Center, Hitachi Ltd.
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Itoga Toshihiko
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185
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Nishioka Yasushiro
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185
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Ohyu Kiyonori
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185
著作論文
- Advantages of Fluorine Introduction in Boron Implanted Shallow p^+/n-Junction Formation
- Improvement of SiO2/Si Interface Properties Utilising Fluorine Ion Implantation and Drive-in Diffusion