Huang Tiao-Yuan | Institute of Electronics, National Chiao-Tung University, Hsinchu, Taiwan 300, R.O.C.

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概要

• Huang Tiao-Yuanの詳細を見る
• 同名の論文著者
• Institute of Electronics, National Chiao-Tung University, Hsinchu, Taiwan 300, R.O.C.の論文著者

関連著者

• Huang Tiao-yuan

  Institute Of Electronics National Chiao Tung University

• CHIEN Chao-Hsin

  National Nano Device Laboratories

• Lehnen Peer

  Aixtron Ag Kackertstr

• Lu Wen-tai

  Institute Of Electronics National Chiao Tung University

• Yang Ming-jui

  National Nano Device Laboratories

• Shen Shih-wen

  National Nano Device Laboratories

• Lan Wen-ting

  Institute Of Electronics National Chiao-tung University

• Lee Tsung-chieh

  Institute Of Electronics National Chiao-tung University

• Shen Shih-Wen

  National Nano Device Laboratory, Hsinchu, Taiwan 300, R.O.C.

• Lu Wen-Tai

  Institute of Electronics, National Chiao-Tung University, Hsinchu, Taiwan 300, R.O.C.

• Lan Wen-Ting

  Institute of Electronics, National Chiao-Tung University, Hsinchu, Taiwan 300, R.O.C.

• Huang Tiao-Yuan

  Institute of Electronics, National Chiao-Tung University, Hsinchu, Taiwan 300, R.O.C.

• Yang Ming-Jui

  National Nano Device Laboratory, Hsinchu, Taiwan 300, R.O.C.

• Chien Chao-Hsin

  National Nano Device Laboratory, Hsinchu, Taiwan 300, R.O.C.

• Lee Tsung-Chieh

  Institute of Electronics, National Chiao-Tung University, Hsinchu, Taiwan 300, R.O.C.

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著作論文

• Improvements on Electrical Characteristics of p-Channel Metal–Oxide–Semiconductor Field Effect Transistors with HfO2 Gate Stacks by Post Deposition N2O Plasma Treatment

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