Fujisaki Yoshihisa | R&D Association for Future Electron Device, 2-9-14 Toranomon, Minato-ku, Tokyo 105-0001, Japan

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概要

• Fujisaki Yoshihisaの詳細を見る
• 同名の論文著者
• R&D Association for Future Electron Device, 2-9-14 Toranomon, Minato-ku, Tokyo 105-0001, Japanの論文著者

関連著者

• OHKI Hiroshi

  R&D Association for Future Electron Devices

• Ishiwara Hiroshi

  Frontier Collaborative Research Center Tokyo Insitute Of Technology

• FUJISAKI Yoshihisa

  R&D Association for Future Electron Devices

• Fujisaki Yoshihisa

  R&D Association for Future Electron Device, 2-9-14 Toranomon, Minato-ku, Tokyo 105-0001, Japan

• Ohki Hiroshi

  R&D Association for Future Electron Device, 2-9-14 Toranomon, Minato-ku, Tokyo 105-0001, Japan

著作論文

• Characterization of Si- and Mo-codoped Bi3.35La0.75Ti3O12 Ferroelectric Thin Films

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