Yokota Katsuhiro | Faculty of Engineering and HRC, Kansai University, Suita, Osaka 564-8680, Japan
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- Faculty of Engineering and HRC, Kansai University, Suita, Osaka 564-8680, Japanの論文著者
Faculty of Engineering and HRC, Kansai University, Suita, Osaka 564-8680, Japan | 論文
- Neutralization and Discharge of Electron Traps in Hydrogenated Diamond-Like Carbon Films Deposited on Ground Electrode by Plasma-Enhanced Chemical Vapor Deposition
- Annealing of Hydrogenated Diamond-like Carbon Films Deposited on Ground Electrode of Plasma Enhanced Chemical Vapor Deposition System
- Dielectric Constants on Mixture Thin Films of Barium Carbide and Barium Nitrate Deposited on Silicon Wafers by Barium Carbonate Electron Beam Evaporation Using Nitrogen Molecular and Ion Beams