Uchida Hiroshi | Department of Materials and Life Sciences, Sophia University, Chiyoda, Tokyo 102-8554, Japan
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概要
- Uchida Hiroshiの詳細を見る
- 同名の論文著者
- Department of Materials and Life Sciences, Sophia University, Chiyoda, Tokyo 102-8554, Japanの論文著者
関連著者
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Uchida Hiroshi
Department Of Anesthesia Tottori Prefectural Central Hospital
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Uchida Hiroshi
Department of Materials and Life Sciences, Sophia University, Chiyoda, Tokyo 102-8554, Japan
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Funakubo Hiroshi
Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials
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Ehara Yoshitaka
Department Of Engineering In Applied Chemistry Faculty Of Engineering And Resource Science Akita Uni
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KIMURA Junichi
Department of Chemistry, Nagoya University
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Koda Seiichiro
Department Of Chemical Engineering Facutly Of Engineering The University Of Tokyo
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Mizutani Yuki
Department of Materials and Life Sciences, Sophia University, Chiyoda, Tokyo 102-8554, Japan
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Kondoh Yohta
Department of Materials and Life Sciences, Sophia University, Chiyoda, Tokyo 102-8554, Japan
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Sasajima Keiichi
Department of Materials and Life Sciences, Sophia University, Chiyoda, Tokyo 102-8554, Japan
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Hayashi Mari
Department of Materials and Life Sciences, Sophia University, Chiyoda, Tokyo 102-8554, Japan
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Takuwa Itaru
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Funakubo Hiroshi
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Koda Seiichiro
Department of Materials and Life Sciences, Sophia University, Chiyoda, Tokyo 102-8554, Japan
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Kimura Junichi
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Ehara Yoshitaka
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
著作論文
- Crystal Orientation Control of Bismuth Layer-Structured Dielectric Films Using Interface Layers of Perovskite-Type Oxides
- Preparation of (001)-Oriented CaBi4Ti4O15 and SrBi4Ti4O15 Films Using LaNiO3 Nucleation Layer on Pt-passivated Si Wafer