Nagase Koichi | Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, Sendai 980-8577, Japan
スポンサーリンク
概要
- Nagase Koichiの詳細を見る
- 同名の論文著者
- Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, Sendai 980-8577, Japanの論文著者
関連著者
-
NAKAGAWA Masaru
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
-
Nagase Koichi
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, Sendai 980-8577, Japan
-
Kubo Shoichi
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, Sendai 980-8577, Japan
-
Kudo Shimpei
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, Sendai 980-8577, Japan
-
Sugihara Okihiro
Institute Of Multidisciplinary Research For Advanced Materials (imram) Tohoku University
-
Masaru Nakagawa
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
-
NAKAGAWA Masaru
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
-
Nakagawa Masaru
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, Sendai 980-8577, Japan
-
YUN Cheol
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
-
KUBO Shoichi
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
-
Shoichi Kubo
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
-
NAGASE Koichi
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
-
Sugihara Okihiro
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, Sendai 980-8577, Japan
著作論文
- Silica/Ultraviolet-Cured Resin Nanocomposites for Replica Molds in Ultraviolet Nanoimprinting (Special Issue : Microprocesses and Nanotechnology)
- Resist Properties of Thin Poly(methyl methacrylate) and Polystyrene Films Patterned by Thermal Nanoimprint Lithography for Au Electrodeposition
- Optically Transparent and Refractive Index-Tunable ZrO2/Photopolymer Composites Designed for Ultraviolet Nanoimprinting
- Gold Mesh Structures with Controlled Aperture Ratios Fabricated by Reactive-monolayer-assisted Thermal Nanoimprint Lithography