Masaru Nakagawa | Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
スポンサーリンク
概要
- Nakagawa Masaruの詳細を見る
- 同名の論文著者
- Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japanの論文著者
関連著者
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Masaru Nakagawa
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Sakai Nobuji
Toyo Gosei Co. Ltd Chiba Jpn
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Matsui Shinji
Japan Science and Technology Agency (JST), Core Research Evolutional Science and Technology (CREST), 5 Sanbancho, Chiyoda, Tokyo 102-0075, Japan
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Nobuji Sakai
Toyo Gosei Co., Ltd., 4-2-1 Wakahagi, Inba, Chiba 270-1609, Japan
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Nobuji Sakai
Toyo Gosei Co., Ltd., 1603 Kamimyoden, Ichikawa, Chiba 272-0012, Japan
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Kobayashi Kei
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Kohno Akihiro
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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KOBAYASHI Kei
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
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NAKAGAWA Masaru
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
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Nagase Koichi
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, Sendai 980-8577, Japan
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Kubo Shoichi
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, Sendai 980-8577, Japan
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Shoichi Kubo
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Kei Kobayashi
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
著作論文
- Enhanced Durability of Antisticking Layers by Recoating a Silica Surface with Fluorinated Alkylsilane Derivatives by Chemical Vapor Surface Modification
- Fluorescent UV-Curable Resists for UV Nanoimprint Lithography
- Resist Properties of Thin Poly(methyl methacrylate) and Polystyrene Films Patterned by Thermal Nanoimprint Lithography for Au Electrodeposition