UENO Nobuo | Department of Image Science and Engineering, Faculty of Engineering, Chiba University
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概要
Department of Image Science and Engineering, Faculty of Engineering, Chiba University | 論文
- Direct Etching of Resists by UV Light
- Studies on diazo type process. VI. Physico-chemical studies on 1-(p-dimethylaminophenylazo)-2-naphthol-3,6-disulfonic acid in aqueous solutions.
- Photodegradable Toners for Electrophotography III. Accelerated Photodegradation and Suppressed Photocrosslinking of Matrix Resin-Their Dependence on Polymer Composition, UV-light Source, and Irradiation Conditions
- A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep Ultraviolet Lithography:II. Limited Permeation of Si Compounds from Liquid Phase^* : Instrumentation, Measurement, and Fabrication Technology
- Photodegradable Toners for Electrophotography II. Accelerated Photodegradation of Matrix Resin by Deep Ultraviolet-Exposure at an Elevated Temperature