Yoshida Masato | Electronic Materials R&D Center, Hitachi Chemical Co., Ltd., 1380-1 Nishihara, Tarasaki, Hitachi-Naka, Ibaraki 312-0003, Japan
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概要
- 同名の論文著者
- Electronic Materials R&D Center, Hitachi Chemical Co., Ltd., 1380-1 Nishihara, Tarasaki, Hitachi-Naka, Ibaraki 312-0003, Japanの論文著者
関連著者
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Yoshida Masato
Electronic Materials R&D Center, Hitachi Chemical Co., Ltd., 1380-1 Nishihara, Tarasaki, Hitachi-Naka, Ibaraki 312-0003, Japan
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Ashizawa Toranosuke
Semiconductor Materials Division, Hitachi Chemical Co., Ltd., 4-13-1 Higashi, Hitachi, Ibaraki 317-8555, Japan
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Yamamoto Hajime
School Of Bionics Tokyo Univ. Of Technol.
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Imamura Hayao
Department Of Advanced Materials Science And Engineering Faculty Of Engineering Yamaguchi University
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Yano Toyohiko
Research Laboratory For Nuclear Reactors Tokyo Institute Of Technology
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Sakata Yoshihisa
Department Of Advanced Materials Science And Engineering Faculty Of Engineering Yamaguchi University
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Yokota Hiroshi
High Performance Materials R&D Center, Hitachi Chemical Co., Ltd., Hitachinaka, Ibaraki 312-0003, Japan
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Koyama Naoyuki
Electronic Materials R&D Center, Hitachi Chemical Co., Ltd., 1380-1 Nishihara, Tarasaki, Hitachi-Naka, Ibaraki 312-0003, Japan
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Doi Toshiro
Department of Education, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan
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Yagi Yasuhiro
Advanced Materials R&D Center, Hitachi Chemical Co., Ltd., Tsukuba, Ibaraki 300-4247, Japan
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Yano Toyohiko
Research Laboratory for Nuclear Reactors, Tokyo Institute of Technology, Meguro-ku, Tokyo 152-8550, Japan
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Ishibashi Hiroyuki
High Performance Materials R&D Center, Hitachi Chemical Co., Ltd., Hitachinaka, Ibaraki 312-0003, Japan
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Sakata Yoshihisa
Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University, 2-16-1 Tokiwadai, Ube, Yamaguchi 755-8611, Japan
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Imamura Hayao
Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University, 2-16-1 Tokiwadai, Ube, Yamaguchi 755-8611, Japan
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Nishiyama Masaya
Semiconductor Materials Division, Hitachi Chemical Co., Ltd., 4-13-1 Higashi, Hitachi, Ibaraki 317-8555, Japan
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Ono Hiroshi
Electronic Materials R&D Center, Hitachi Chemical Co., Ltd., 1380-1 Nishihara, Tarasaki, Hitachi-Naka, Ibaraki 312-0003, Japan
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Ishibashi Hiroyuki
High Performance Materials R&D Center, Hitachi Chemical Co., Ltd., Hitachinaka, Ibaraki 312-0003, Japan
著作論文
- Preparation of Tb-Doped Y2SiO5 Phosphor by Spray Pyrolysis Using Two-Fluid Nozzle Spray Generator
- A New Cerium-Based Ternary Oxide Slurry, CeTi2O6, for Chemical-Mechanical Polishing
- Effect of Pad Surface Roughness on SiO2 Removal Rate in Chemical Mechanical Polishing with Ceria Slurry