Enomoto Haruki | Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan

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概要

関連著者

Arai Shigehisa
Quantum Nanoelectronics Research Center Tokyo Institute Of Technology
Sakamoto Shinichi
Department Of Electrical Engineering Yamanashi University
Inoue Keita
Department Of Computer Science School Of Electrical And Computer Engineering National Defense Agency
NISHIYAMA Nobuhiko
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
Arai Shigehisa
Quantum Nanoelectronics Research Center, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan
Plumwongrot Dhanorm
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan
Enomoto Haruki
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan
Tamura Shigeo
Technical Department, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan
Maruyama Takeo
School of Electrical and Computer Engineering, College of Science and Engineering, Kanazawa University, Kanazawa 920-1192, Japan
Sakamoto Shinichi
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan
Inoue Keita
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan

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著作論文

Loss Reduction of Si Wire Waveguide Fabricated by Edge-Enhancement Writing for Electron Beam Lithography and Reactive Ion Etching Using Double Layered Resist Mask with C60

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