Arie Hiroyuki | Renesas Technology Corp., 20-1 Josuihon-cho 5-chome, Kodaira, Tokyo 187-8588, Japan

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概要

• Arie Hiroyukiの詳細を見る
• 同名の論文著者
• Renesas Technology Corp., 20-1 Josuihon-cho 5-chome, Kodaira, Tokyo 187-8588, Japanの論文著者

関連著者

• Kawai Naoyuki

  Renesas Technol. Corp. Tokyo Jpn

• NAKAMURA Minoru

  Hitachi Research Laboratory

• SAITO Shigeaki

  Renesas Technology Corp.

• ARIE Hiroyuki

  Renesas Technology Corp.

• Murakami Susumu

  Hitachi Research Laboratory Hitachi Ltd.

• Arie Hiroyuki

  Renesas Technology Corp., 20-1 Josuihon-cho 5-chome, Kodaira, Tokyo 187-8588, Japan

著作論文

• Diffusion-Temperature-Dependent Formation of Cu Centers in Cu-Saturated Silicon Crystals Studied by Photoluminescence and Deep-Level Transient Spectroscopy

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