Koichi Sasaki | Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Japan
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- Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Japanの論文著者
Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Japan | 論文
- Dissociation Channels of c-C4F8 to CF2 Radical in Reactive Plasma
- Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet
- Quantum Chemical Investigation of Si Chemical Dry Etching by Flowing NF into N Downflow Plasma
- Quantum Chemical Investigation for Chemical Dry Etching of SiO by Flowing NF into H Downflow Plasma
- Analysis of GaN Damage Induced by Cl2/SiCl4/Ar Plasma