HAMASAKI Ryoji | Kasado Works, Hitachi, Ltd.
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概要
Kasado Works, Hitachi, Ltd. | 論文
- Highly Anisotropic Etching of Polysilicon by Time-Modulation Bias
- Highly Selective Etching of Poly-Si by Time Modulation Bias
- Evaluation of Charge Passed through Gate-Oxide Films Using a Charging Damage Measurement Electrode
- Mechanism for CF Polymer Film Deposition through Deep SiO_2 Holes in Electron Cyclotron Resonance Plasma
- Highly Anisotropic Etching of Polysilicon by Time-Modulation Bias