スポンサーリンク
Kasado Works, Hitachi, Ltd. | 論文
- Highly Anisotropic Etching of Polysilicon by Time-Modulation Bias
- Highly Selective Etching of Poly-Si by Time Modulation Bias
- Evaluation of Charge Passed through Gate-Oxide Films Using a Charging Damage Measurement Electrode
- Mechanism for CF Polymer Film Deposition through Deep SiO_2 Holes in Electron Cyclotron Resonance Plasma
- Highly Anisotropic Etching of Polysilicon by Time-Modulation Bias