Ohno Tomoya | Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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- Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japanの論文著者
Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan | 論文
- Ni Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using $\text{O$_{2}$} + \text{H$_{2}$O}$ Mixed Gas
- Target-Surface Compound Layers Formed by Reactive Sputtering of Si Target in $\text{Ar}+\text{O$_{2}$}$ and $\text{Ar}+\text{N$_{2}$}$ Mixed Gases
- Preparation of Hydrogen-Containing Ta2O5 Thin Films by Reactive Sputtering Using $\text{O$_{2}$}+\text{H$_{2}$O}$ Mixed Gas
- Effects of Substrate Cooling during Sputter Deposition of Hydrogen-Containing Ta2O5 Thin Films in H2O Atmosphere on their Ion Conductivity