Abe Yoshio | Department of Materials Science and Engineering, Kitami Institute of Technology, Koen-cho, Kitami, Hokkaido 090-8507, Japan
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概要
- Abe Yoshioの詳細を見る
- 同名の論文著者
- Department of Materials Science and Engineering, Kitami Institute of Technology, Koen-cho, Kitami, Hokkaido 090-8507, Japanの論文著者
関連著者
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Sasaki Katsutaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Abe Yoshio
Department of Materials Science and Engineering, Kitami Institute of Technology, Koen-cho, Kitami, Hokkaido 090-8507, Japan
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Abe Yoshio
Department of Materials Science and Engineering, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan
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KATO Kiyohiko
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology
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Shinkai Satoko
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
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Yanagisawa Hideto
Department Of Electrical And Electronic Engineering Kitami Institute Of Technology
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Abe Yoshio
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami 090-8507, Japan
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Abe Yoshio
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan
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Kawamura Midori
Department of Materials Science and Engineering, Kitami Institute of Technology, Koen-cho, Kitami, Hokkaido 090-8507, Japan
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Kawamura Midori
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Shinkai Satoko
Department of Control Engineering, Takuma National College of Technology, 551 Koda, Takuma-cho, Kagawa 769-1192, Japan
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Sasaki Katsutaka
Department of Materials Science and Engineering, Kitami Institute of Technology, Koen-cho, Kitami, Hokkaido 090-8507, Japan
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Inami Yuuki
Department of Materials Science and Engineering, Kitami Institute of Technology, Koen-cho, Kitami, Hokkaido 090-8507, Japan
著作論文
- Epitaxial Growth of (001)Rh Thin Film on (001)MgO Single-Crystal Substrate by Sputtering
- Realization of Sequential Epitaxial Growth of Cu/HfN Bilayered Films on (111) and (001) Si
- Thermally Stable Ag Thin Films Modified with Very Thin Al Oxide layers