SHUKURI Shoji | Semiconductor & Integrated Circuits Div.Hitachi Ltd.
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概要
Semiconductor & Integrated Circuits Div.Hitachi Ltd. | 論文
- High Dose Rate Effect of Focused-Ion-Beam Boron Implantation into Silicon
- Material Representations and Algorithms for Nanometer Lithography Simulation (Special Issue on 1993 VLSI Process and Device Modeling Workshop (VPAD93))
- Molecular Scale E-Beam Resist Development Simulation for Pattern Fluctuation Analysis
- Submicron Channel MOSFET Using Focused Boron Ion Beam Implantation into Silicon
- Electrical Properties of Focused-Ion-Beam Boron-Implanted Silicon