KOBAYASHI Toshihiko | Department of Electronic Engineering, Faculty of Engineering, Tokai University
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- Department of Electronic Engineering, Faculty of Engineering, Tokai Universityの論文著者
Department of Electronic Engineering, Faculty of Engineering, Tokai University | 論文
- Characterization of Surface Conductive Diamond Layer Grown by Microwave Plasma Chemical Vapor Deposition
- Synthesis of β-SiC Layer in Silicon by Carbon Ion 'Hot' Implantation
- Structural Properties of Silicon Oxide Films Prepared by the RF Substrate Biased ECR Plasma CVD Method
- Properties of Silicon Oxynitride Films Prepared by ECR Plasma CVD Method : Surfaces, Interfaces and Films
- Hydrogen Concentration and Bond Configurations in Silicon Nitride Films Prepared by ECR Plasma CVD Method