Sekine Makoto | Microelectronics Engineering Labs., Toshiba Corporation
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概要
Microelectronics Engineering Labs., Toshiba Corporation | 論文
- Fabrication of Micro-Marks for Electron-Beam Lithography
- Proximity Effect Correction For Electron Beam Lithography: Highly Accurate Correction Method
- Lithography Simulator for Electon Beam/Deep UV Intra-Level Mix & Match
- Highly Uniform Low-Pressure Chemical Vapor Deposition (LP-CVD) of Si_3N_4 Film on Tungsten for Advanced Low-Resistivity "Polymetal" Gate Interconnects
- Plasma-Damage-Free Gate Process Using Chemical Mechanical Polishing for 0.1 μm MOSFETs