MIZUNO Tomohisa | ULSI Research Laboratories, TOSHIBA Corporation
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概要
ULSI Research Laboratories, TOSHIBA Corporation | 論文
- Two Correlated Mechanisms in Thin SiO_2 Breakdown
- Reliability of Structurally Modified Ultra-Thin Gate Oxides
- An Improved Bandgap Narrowing Model Based on Corrected Intrinsic Carrier Concentration
- Observation of Oxide-Thickness-Dependent Interface Roughness in Si MOS Structure
- Observation of Oxide Thickness Dependent Interface Roughness in Si MOS Structure