Kishi Koji | the Research Center for Nanodevices and Systems, Hiroshima University
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概要
the Research Center for Nanodevices and Systems, Hiroshima University | 論文
- A Study of Electrical Characteristics Improvements in Sub-0.1 μm Gate Length MOSFETs by Low Temperature Operation
- Fabrication of 100 nm Width Fine Active-Region Using LOCOS Isolation(Special Issue on Advanced Sub-0.1μm CMOS Devices)
- Boundary-Active-Only Adaptive Power-Reduction Scheme for Region-Growing Video-Segmentation(Image Processing and Video Processing)
- Digital Low-Power Real-Time Video Segmentation by Region Growing
- Area-Efficient Multi-Port SRAMs for On-Chip Data-Storage with High Random-Access Bandwidth and Large Storage Capacity