Ahn Chang-Nam | Toppan Photomask, Icheon 467-746, Korea

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• 同名の論文著者
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関連著者

• Ahn Chang-Nam

  Toppan Photomask, Icheon 467-746, Korea

• Oh Hye-keun

  Applied Physics Department Hanyang University

• An Ilsin

  Hanyang Univ. Ansan Kor

• Shin Dong-Soo

  Hanyang University, Ansan 426-791, Korea

• Shin Dong-Soo

  Applied Physics Department, Hanyang University, Ansan 426-791, Korea

• Lee Ji-Eun

  Applied Physics Department, Hanyang University, Ansan 426-791, Korea

• Kang Hye-Young

  Applied Physics Department, Hanyang University, Ansan 426-791, Korea

• Jeong Hee-Jun

  Applied Physics Department, Hanyang University, Ansan 426-791, Korea

• An Ilsin

  Applied Physics Department, Hanyang University, Ansan 426-791, Korea

• Oh Hye-Keun

  Hanyang University, Ansan 426-791, Korea

• Kang Hye-Young

  Hanyang University, Ansan 426-791, Korea

• Jeong HeeJun

  Hanyang University, Ansan 426-791, Korea

• An Ilsin

  Hanyang University, Ansan 426-791, Korea

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著作論文

• Chromeless Phase Lithography Using Scattering Bars and Zebra Patterns
• Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography

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