Oh Hye-keun | Applied Physics Department Hanyang University

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概要

• 同名の論文著者
• Applied Physics Department Hanyang Universityの論文著者

関連著者

• Oh Hye-keun

  Applied Physics Department Hanyang University

• Kim Sung-hyuck

  Samsung Electronics Co.

• Lee Chang

  Samsung Advanced Institute Of Technology Semiconductor Device Laboratory

• Shin Dong-Soo

  Applied Physics Department, Hanyang University, Ansan 426-791, Korea

• Lee Ji-Eun

  Applied Physics Department, Hanyang University, Ansan 426-791, Korea

• Kang Hye-Young

  Applied Physics Department, Hanyang University, Ansan 426-791, Korea

• Jeong Hee-Jun

  Applied Physics Department, Hanyang University, Ansan 426-791, Korea

• An Ilsin

  Applied Physics Department, Hanyang University, Ansan 426-791, Korea

• Ahn Chang-Nam

  Toppan Photomask, Icheon 467-746, Korea

• Oh Hye-Keun

  Applied Physics Department, Hanyang University, Ansan 426-791, Korea

• Park Jin-Back

  Applied Physics Department, Hanyang University, Ansan 426-791, Korea

• Kim Sung-Jin

  Applied Physics Department, Hanyang University, Ansan 426-791, Korea

• Cho Jung-Hyuk

  Samsung Electronics Co., Ltd., Cheonan, Chungcheongnam-Do 330-300, Korea

• Lee Chang

  Samsung Electronics Co., San #16, Banwol-Ri, Taean-Eup, Hwasung, Gyeonggi-Do 445-701, Korea

• Kim Sung-Hyuck

  Samsung Electronics Co., Ltd., Yongin, Gyeonggi-Do 449-711, Korea

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著作論文

• Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography
• ArF Photoresist Parameter Optimization for Mask Error Enhancement Factor Reduction
• Acid Diffusion Length Corresponding to Post Exposure Bake Time and Temperature

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