KADOMURA S. | Technology Development Division, Semiconductor Business Group, Sony Corporation
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- 同名の論文著者
- Technology Development Division, Semiconductor Business Group, Sony Corporationの論文著者
Technology Development Division, Semiconductor Business Group, Sony Corporation | 論文
- PMOSFET Vth Modulation Technique using Fluorine Treatment through ALD-TiN Suitable for CMOS Devices
- Application of HfSiON to Deep Trench Capacitors of Sub-45nm Node Embedded DRAM
- Tinv Scaling and Jg Reducing for nMOSFET with HfSi_x/HfO_2 Gate Stack by Interfacial Layer Formation Using Ozone Water Treatment Process
- Gate Overlapped Raised Extension Structure (GORES) MOSFET by Using In-situ Doped Selective Si Epitaxy
- 34.1:Invited Paper:Reduction of Halo in Transparent Electroluminescent(EL)Display(2.透過型薄膜EL)(Report on 2000 SID International Symposium)