Kido Shigenori | Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

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概要

• 同名の論文著者
• Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japanの論文著者

関連著者

• Kido Shigenori

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• OKADA Masakazu

  Renesas Technology Corporation

• Asai Koyu

  Renesas Electronics Corporation, 751 Horiguchi, Hitachinaka, Ibaraki 312-8504, Japan

• Hiroshi Miyatake

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• Masahiko Fujisawa

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• Fujisawa Masahiko

  Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan

• Hirose Yukinori

  Renesas Electronics Corporation, 751 Horiguchi, Hitachinaka, Ibaraki 312-8504, Japan

• Izumitani Junko

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• Kodama Daisuke

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• Hiroyuki Chibahara

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• Yoshihiro Oka

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• Kinya Goto

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• Naohito Suzumura

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• Nakanishi Nobuto

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• Daisuke Kodama

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• Junko Izumitani

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• Shigenori Kido

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• Furuhashi Takahisa

  Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan

• Matsumoto Masahiro

  Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan

• Kawano Yuichi

  Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan

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著作論文

• Cu Dual-Damascene Interconnects with Direct Chemical Mechanical Polishing Process on Porous Low-$k$ Film
• Analysis of sidewall damage layer in low-k film using the interline dielectric capacitance measurements (Special issue: Advanced metallization for ULSI applications)

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