Murakami A | Fuji Xerox Co. Ltd. Ebina Jpn
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概要
Fuji Xerox Co. Ltd. Ebina Jpn | 論文
- Characterization of Directly Deposited Silicon Films Using Low-Energy Focused Ion Beam
- Characterization of Directly Deposited Silicon Films Using Low-Energy Focused Ion Beam
- Maskless Deposition of Au on GaAs by Low-Energy Focused Ion Beam
- Electrical Transport Properties of p-GaN
- Schottky Barrier on n-Type Al_Ga_N Grown by Organometalic Vapor Phase Epitaxy