Hikosaka Yukinobu | Department O Electrical Engineering Nagoya University:basic Process Development Division Fujitsu Ltd
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Department O Electrical Engineering Nagoya University:basic Process Development Division Fujitsu Ltd | 論文
- Drastic Change in CF_2 and CF_3 Kinetics Induced by Hydrogen Addition into CF_4 Etching Plasma
- Spatial Distribution and Surface Loss of CF_3 and CF_2 Radicals in a CF_4 Etching Plasma
- Free Radicals in an Inductively Coupled Etching Plasma
- Radical Kinetics in a Fluorocarbon Etching Plasma