Tsukuda Tatsuaki | Faculty Of Science And Technology Science University Of Tokyo
スポンサーリンク
概要
関連著者
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Ikoma Hideaki
Faculty Of Science And Technology Science University Of Tokyo
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Tsukuda Tatsuaki
Faculty Of Science And Technology Science University Of Tokyo
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Oka Fumihito
Faculty Of Science And Technology Science University Of Tokyo
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TACHIKAWA Masayuki
Faculty of Science and Technology, Science University of Tokyo
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TSUKUDA Tatsuaki
Faculty of Science and Technology, Science University of Tokyo
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Tachikawa M
Faculty Of Science And Technology Science University Of Tokyo
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Tachikawa Masayuki
Faculty Of Science And Technology Science University Of Tokyo
著作論文
- Effects of Gas-Flow-Rate Ratio on Electrical Characteristics and Fowler-Nordheim Stress Resistance of Si Oxynitride Grown with Helicon-Wave-Excited N_2-Ar plasma
- Low-Temperature Growth of Si Oxide with Good Electrical Qualities Using Helicon-Wave-Excited O_2-Ar Plasma and Forming Gas Annealing