Nakayama Yasuhiko | Kankyo Semiconductors Co. Ltd.
スポンサーリンク
概要
関連著者
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Kuroda Ryo
National Institute Of Advanced Industrial Science And Technology (aist)
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MAKITA Yunosuke
National Institute of Advanced Industrial Science and Technology (AIST)
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TANOUE Hisao
National Institute of Advanced Industrial Science and Technology (AIST)
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Nakayama Yasuhiko
Kankyo Semiconductors Co. Ltd.
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Otogawa Naotaka
Kankyo Semiconductors Co. Ltd.
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LIU Zhengxin
National Institute of Advanced Industrial Science and Technology (AIST)
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FUKUZAWA Yasuhiro
Kankyo Semiconductors Co., Ltd.
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LIU Zhengxin
Technology Development Department, System Engineers' Co., Ltd.
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OSAMURA Masato
Technology Development Department, System Engineers' Co., Ltd.
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FUKUZAWA Yasuhiro
Technology Development Department, System Engineers' Co., Ltd.
著作論文
- Boron Doping for p-Type β-FeSi_2 Films by Sputtering Method
- Arsenic Doping of $n$-Type $\beta$-FeSi2 Films by Sputtering Method