Asano Akira | The Institute Of Scientific And Industrial Research Osaka University

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概要

関連著者

Tamura Masafumi
The Institute Of Scientific And Industrial Research Osaka University
TAKAHASHI Masao
The Institute of Scientific and Industrial Research, Osaka University
Maida Osamu
The Institute Of Scientific And Industrial Research Osaka University
ASANO Akira
The Institute of Scientific and Industrial Research, Osaka University
KOBAYASHI Hikaru
The Institute of Scientific and Industrial Research, Osaka University
Asano Akira
The Institute Of Scientific And Industrial Research Osaka University
Takahashi Masao
The Institute Of Scientific And Industrial Research Osaka University
Kobayashi Hikaru
The Institute Of Scientific And Industrial Research Osaka University

著作論文

Ultrathin Silicon Oxynitride Layers with a Low Leakage Current Density Formed by Plasma Nitridation Using Low Energy Electron Impact and Chemical Oxidation

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