Idris Irman | Department Of Physical Electronics Tokyo Institute Of Technology
スポンサーリンク
概要
関連著者
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Sugiura Osamu
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Idris Irman
Department Of Physical Electronics Tokyo Institute Of Technology
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Idris I
Department Of Physical Electronics Tokyo Institute Of Technology
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SUGIURA Osamu
Department of Physical Electronics, Tokyo Institute of Technology
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杉浦 修
Tokyo Inst. Technol. Tokyo Jpn
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IDRIS Irman
Department of Physical Electronics, Tokyo Institute of Technology
著作論文
- Film Characteristics of Low-Temperature Plasma-Enhanced Chemical Vapor Deposition Silicon Dioxide Using Tetraisocyanatesilane and Oxygen
- Hydrogen-Free Plasma-Enhanced Chemical Vapor Deposition of Silicon Dioxide Using Tetra-isocyanate-silane (Si(NCO)_4)