Okushima Mototsugu | Ulsi Device Development Laboratory Nec Corporation
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概要
関連著者
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Noguchi Ko
Ulsi Device Development Laboratories Nec Corporation
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Okushima Mototsugu
Ulsi Device Development Laboratory Nec Corporation
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Noguchi Ko
Ulsi Device Development Laboratory Nec Corporation
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OKUSHIMA Mototsugu
ULSI Device Development Laboratory, NEC Corporation
著作論文
- Influence of Gate Oxide Quality on Plasma Process-Induced Charging Damage in Ultra Thin Gate Oxide
- Influence of Gate Oxide Quality on Plasma Process-Induced Damage in Ultra Thin Gate Oxide