Higashiyama K | Univ. Tsukuba Ibaraki Jpn
スポンサーリンク
概要
関連著者
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TANAKA Shoji
Superconductivity Research Laboratory, International Superconductivity Technology Center
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Hirabayashi I
Superconductivity Research Laboratory International Superconductivity Technology Center
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Hirabayashi Izumi
Superconductivity Research Laboratory International Superconductivity Technology Center
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Higashiyama K
Univ. Tsukuba Ibaraki Jpn
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HIGASHIYAMA Kazutoshi
Superconductivity Research Laboratory, Nagoya Division, International Superconductivity Technology C
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Tanaka Shoji
Superconductivity Research Laboratory International Superconductivity Technology Center
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Hirabayashi Izumi
Superconductivity Research Laboratory (SRL), International Superconductivity Technology Center (ISTEC), 1-10-13 Shinonome, Koto-ku, Tokyo 135-0062, Japan
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Tanaka S
Superconductivity Research Laboratory International Superconductivity Technology Center
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Ushida Takahisa
Superconductivity Research Laboratory Nagoya Division International Superconductivity Technology Cen
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Tanaka S
Osaka Prefecture Univ. Sakai
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Tanaka S
International Superconductivity Technol. Center Tokyo Jpn
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Tanaka S
Tokyo Inst. Technol. Tokyo Jpn
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Higa Hiroyuki
Superconductivity Research Laboratory Nagoya Division International Superconductivity Technology Cen
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HIGA Hiroyuki
Superconductivity Research Laboratory, Nagoya Division, International Superconductivity Technology C
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HIGA Hiroyuki
Department of Electrical and Computer Engineering, Nagoya Institute of Technology
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Uchida Takahisa
Superconductivity Research Laboratory, International Superconductivity Technology Center
著作論文
- Effect of UV Light Irradiation on the A-Axis Orientation Mechanism for Y_1Ba_2Cu_3O_ Films Prepared by Laser Metalorganic Chemical Vapor Deposition
- Preparation and Characterization of YBa_2Cu_3O_ Films Containing an Excess Amount of Cu by Chemical Vapor Deposition
- Excimer Laser-Assisted Chemical Vapor Deposition of Metal-Oxide Thin Film from β-Diketone Complexes
- In Situ Optical Monitoring of Growth Rate and Surface Roughness of YBa_2Cu_3O_ Films in Chemical Vapor Deposition