ISHIKAWA Kenji | Plasma Technology Laboratory, Association of Super-advanced Electronics Technologies(ASET)

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概要

関連著者

Sekine Makoto
Plasma Technology Laboratory Association Of Super-advanced Electronics Technologies(aset)
ISHIKAWA Kenji
Plasma Technology Laboratory, Association of Super-advanced Electronics Technologies(ASET)
Ishikawa Kenji
Plasma Technology Laboratory Association Of Super-advanced Electronics Technologies(aset)
Sekine Makoto
Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Japan
Ishikawa Kenji
Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Japan
Ishikawa Kenji
Plasma Nano-technology Research Center, Nagoya University, Nagoya 464-8603, Japan
Sekine Makoto
Plasma Nano-technology Research Center, Nagoya University, Nagoya 464-8603, Japan

著作論文

In-situ Time-Resolved Infrared Spectroscopic Study of Silicon-Oxide Surface during Selective Etching over Silicon in Fluorocarbon Plasma

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