NOMURA Hideshi | Department of Information Electronics, School of Engineering, Nagoya University
スポンサーリンク
概要
関連著者
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Nomura H
Toshiba Corp. Yokohama Jpn
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Kono Akihiro
Center for Cooperative Research in Advanced Science and Technology, Nagoya University
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Kono A
Nagoya Univ. Nagoya Jpn
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Kono Akihiro
Department Of Electrical Engineering And Computer Science Nagoya University
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Nomura H
Laboratory Of Chemistry Department Of Natural Science School Of Science And Technology Tokyo Denki U
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Goto Toshio
Department Of Electronics Faculty Of Engineering Nagoya University
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NOMURA Hideshi
Department of Information Electronics, School of Engineering, Nagoya University
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Goto Toshio
Department Of Electronic Mechanical Engineering Nagoya University
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GOTO Toshio
Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University
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Koike N
Nagoya Univ. Nagoya Jpn
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後藤 俊夫
Imram Tohoku University
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KOIKE Naoki
Department of Information Electronics, School of Engineering, Nagoya University
著作論文
- Dilution-Gas Effect on Electron Density and Temperature in RF SiH_4 Plasma Based on Microwave Cavity Resonance Measurement
- Laser-Induced-Fluorescence Study of the SiH_2 Density in RF SiH_4 Plasmas with Xe, Ar, He, and H_2 Dilution Gases
- Effect of Dilution Gases on the SiH_3 Radical Density in an RF SiH_4 Plasma ( Plasma Processing)